Industrial Hydrogen Fluoride Gas Hf Gas for Glass Industrial Semiconductor Etching Process

Industrial Hydrogen Fluoride Gas Hf Gas for Glass Industrial Semiconductor Etching Process

Properties: It is colorless, clarified and smoking liquid, excitive taste.
Application: As a start for making other fluoride salts. It is used as etch to sculpt glass, electroplate, reagent, zymosis and chinaware.
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Product Details

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Hydrofluoric acid is a colorless, transparent liquid, strongly acidic, and highly corrosive to metals and glass.

Hydrofluoric acid plays an important role in the purification of aluminum and uranium due to its ability to dissolve oxides. Hydrofluoric acid is also used to etch glass, engraving patterns, marking scales and text; the semiconductor industry uses it to remove oxides from silicon surfaces, which can be used in alkylation of isobutane and n-butene in refineries. The catalyst also uses hydrofluoric acid in the "soaking" process of removing oxygen-containing impurities from the surface of the stainless steel. Formula: HF
CAS No.: 7664-39-3
M.W.: 20.01
Properties: It is colorless, clarified and smoking liquid, excitive taste

Specification:

IndexNo.1No.2No.3No.4
HF40%min55%min60%min70%min
H2SiF60.02%max0.2%max0.4%max0.4%max 
H2SO40.02%max0.08 %max0.08 %max0.08%max

Application: As a start for making other fluoride salts. It is used as etch to sculpt glass, electroplate, reagent, zymosis and chinaware. 

Packing: in net 25kg plastic drum

Hazardous details:

UN No.: 1790
Class: 8
Packing: II

Since the ability to bond between a hydrogen atom and a fluorine atom is relatively strong, and hydrogen bonds exist between hydrogen fluoride molecules in an aqueous solution, hydrofluoric acid cannot be completely ionized in water, so theoretically a low concentration of hydrofluoric acid is a weak acid. It is extremely corrosive and can strongly corrode metals, glass and silicon-containing objects. Inhalation of vapors or contact with the skin can cause intractable burns. The laboratory is usually made of fluorite (mainly calcium fluoride) and concentrated sulfuric acid. It needs to be sealed in a plastic bottle and kept in a cool place.

Our company provides a variety of Industrial Hydrogen Fluoride Gas Hf Gas for Glass Industrial Semiconductor Etching Process to meet your various needs. We adhere to the management principles of 'quality first, customer first and credit-based' and always do our best to satisfy potential needs of our customers. We have built our reputation on reliable, committed and strong customer support. We can provide our partners with a unique one-stop service to ensure their needs are well met. In order to meet the needs of modern high-tech, we actively introduce talents, so as to gradually form a reasonable talent echelon.
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